Dielectric and tunable properties of K-doped Ba0.6 Sr0.4 Ti O3 thin films fabricated by sol-gel method

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Sun, Xiaohua ^a   Zhu, Bailin ^a   Liu, Tao ^a   Li, Meiya ^a   Zhao, Xing Zhong ^a   Wang, Danyang ^b   Sun, Chengliang ^b   Chan, Helen L W ^b  

^a WUHAN UNIVERSITY   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; DIFFERENTIAL THERMAL ANALYSIS; SOL-GELS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

DIELECTRIC LOSS; THERMAL EVOLUTIONARY PROCESS;

STRONTIUM COMPOUNDS;

EID: 33646717314     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2189976     Document Type: Article

References (36)

1. C. S. Hwang, S. O. Park, H.-J. Cho, C. S. Kang, H.-K. Kang, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. 67, 2819 (1995).
2. J. C. Shin, C. S. Hwang, and H. J. Kim, Appl. Phys. Lett. 67, 2819 (1995).
3. S. Liu, M. Liu, Y. Zeng, C. Li, S. Chen, Y. Huang, and D. Xia, Mater. Sci. Eng., C 22, 73 (2002).
4. A. Tanaka, IEEE Trans. Electron Devices 43, 1844 (1996).
5. W. Chang and L. Sengupta, J. Appl. Phys. 92, 3941 (2002).
6. W. Chang, J. S. Horwitz, A. C. Carter, J. M. Pond, S. W. Kirchoefer, C. M. Gilmore, and D. B. Chrisey, Appl. Phys. Lett. 74, 1033 (1999).
7. M. W. Cole, C. Hubbard, E. Ngo, M. Ervin, M. Wood, and R. G. Geyer, J. Appl. Phys. 92, 475 (2002).
8. M. W. Cole, C. Hubbard, E. Ngo, M. Ervin, M. Wood, and R. G. Geyer, J. Appl. Phys. 92, 475 (2002).
9. P. C. Joshi and M. W. Cole, Appl. Phys. Lett. 77, 289 (2000).
10. M. W. Cole, W. D. Nothwang, C. Hubbard, and E. Ngo, M. Ervin, J. Appl. Phys. 93, 9218 (2003).
11. Y.-A. Jeon, T.-S. Seo, and S.-G. Yoon, Jpn. J. Appl. Phys., Part 1 40, 6496 (2001).
12. L. Radhapiyari, A. R. James, O. P. Thakur, and C. Prakash, Mater. Sci. Eng., B 117, 5 (2005).
13. M. Jain, S. B. Majumder, R. S. Katiyar, F. A. Miranda, and F. W. Van Keuls, Appl. Phys. Lett. 82, 1911 (2003).
14. S. Y. Wang, B. L. Cheng, C. Wang, S. Y. Dai, H. B. Lu, Y. L. Zhou, Z. H. Chen, and G. Z. Yang, Appl. Phys. Lett. 84, 4116 (2004).
15. S. Y. Wang, B. L. Cheng, C. Wang, H. B. Lu, Y. L. Zhou, Z. H. Chen, and G. Z. Yang, J. Cryst. Growth 259, 137 (2003).
16. K. B. Chong, L. B. Kong, L. Chen, L. Yan, C. Y. Tan, T. Yang, C. K. Ong, and T. Osipowicz, J. Appl. Phys. 95, 1416 (2004).
17. K.-T. Kim and C.-I. Kim, Thin Solid Films 472, 26 (2005).
18. K.-T. Kim and C.-I. Kim, Microelectron. Eng. 66, 835 (2003).
19. M. W. Cole, P. C. Joshi, and M. H. Ervin, J. Appl. Phys. 89, 6336 (2001).
20. W. Y. Park, K. H. Ahn, and C. S. Hwanga, Appl. Phys. Lett. 83, 4387 (2003).
21. C. Shen, Q. Liu, and Q.-F. Liu, Mater. Sci. Eng., B 111, 31 (2004).
22. B. D. Cullity, Elements of X-ray Diffraction, 2nd ed., (Addison-Wesley, Reading, MA, 1978), p. 102.
23. C.-S. Liang and J.-M. Wu, J. Cryst. Growth 274, 173 (2005).
24. S. B. Krupanidi and C. J. Peng, Thin Solid Films 305, 144 (1997).
25. M. W. Cole, C. Hubbard, E. Ngo, M. Ervin, M. Wood, and R. G. Geyer, J. Appl. Phys. 92, 475 (2002).
26. M. W. Cole, P. C. Joshi, and M. H. Ervin, J. Appl. Phys. 89, 6336 (2001).
27. M. W. Cole, P. C. Joshi, M. H. Ervin, M. C. Wood and R. L. Pfeffer, Thin Solid Films 374, 34 (2000).
28. L. Wu, Y.-C. Chen, Y.-P. Chou, Y.-Y. Tsai, and S.-Y. Chu, Jpn. J. Appl. Phys., Part 1 38, 5154 (1999).
29. K. M. Johnson, J. Appl. Phys. 33, 2826 (1962).
30. H. Diamond, J. Appl. Phys. 32, 909 (1961).
31. M. W. Cole and R. G. Geyer, Mechanics of Materials, 92, 3941 (2002).
32. M. Jain, S. B. Majumder, R. S. Katiyar, D. C. Agrawal, and A. S. Bhalla, Appl. Phys. Lett. 81, 3212 (2002).
33. R.-H. Liang, X.-L. Dong, P.-H. Xiang, and H.-D. Li, Jpn. J. Appl. Phys., Part 1 43, 201 (2004).
34. J. W. Liou and B. S. Chiou, Mater. Chem. Phys. 51, 59 (1997).
35. J.-W. Liou and B.-S. Chiou, Jpn. J. Appl. Phys., Part 1 36, 4359 (1997).
36. H.-D. Wu and F. S. Barnes, Integr. Ferroelectr. 22, 291 (1998).