On the role of laminate architecture in thin films synthesized by ion beam assisted deposition

Journal of Materials Science Letters

Volumn 19, Issue 6, 2000, Pages 485-487

  Wang, X ^a,b   Kolitsch, A ^a   Mueklich, A ^a   Prokert, F ^a   Moeller, W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b NONE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; DEPOSITION; HARDNESS; ION BEAMS; ION BOMBARDMENT; METALLIC FILMS; PLASMA APPLICATIONS; SYNTHESIS (CHEMICAL); THIN FILMS;

ALUMINUM NITRIDE; ION BEAM-ASSISTED DEPOSITION (IBAD);

MULTILAYERS;

EID: 0033888611     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006793318213     Document Type: Article

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