Robust, scalable self-aligned platinum silicide process

Applied Physics Letters

Volumn 88, Issue 14, 2006, Pages

  Zhang, Z ^a   Zhang, S L ^a   Ostling M ^a   Lu, J ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; ETCHING; OXIDATION; PLATINUM COMPOUNDS; SUBSTRATES;

PLATINUM SILICIDE PROCESSES; PT SIX NANOWIRES; SURFACE OXIDATIONS; WET ETCH;

NANOSTRUCTURED MATERIALS;

EID: 33646692940     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2194313     Document Type: Article

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