The influence of an OTS self-assembled monolayer on the wear-resistant properties of polysilicon based MEMS

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 863-867

  Baker, M A ^a   Li, J ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

AFM; MEMS; Wear; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; HYDROLYSIS; MICROELECTROMECHANICAL DEVICES; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON NITRIDE; SILICON WAFERS; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITED (LPCVD); OCTADECYLTRICHLOROSILANES (OTS); SELF-ASSEMBLED MONOLAYERS (SAM); WEAR;

POLYSILICON;

EID: 33646595677     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2210     Document Type: Conference Paper

References (14)

1. Linder C, Paratle L, Gretillat MA, Jaecklin VP, Rooij NF. J. Micromech. Micro Eng. 1992; 2:122.
2. Liu H, Bhushan B. Ultramicroscopy 2002; 91: 185.
3. Bhushan B, Israelachvili JN, Landman U. Nature 1995; 374: 607.
4. Åstrom R, Mutikainen R, Kuisma H, Hakola A-H. Wear 2002; 253: 739.
5. Deng K, Collins RJ, Mehregany M, Sukenik CN. J. Electrochem. Soc. 1995; 142: 1278.
6. Srinivasan U, Houston MR, Howe RT, Maboudian R. J. Microelectromech. Syst. 1998; 7: 252.
7. Li J, Cui Z, Baker MA. Surf. Interface Anal. 2004; 36:1254.
8. Seah MP, Spencer SJ. Surf. Interface Anal. 2003; 35: 515.
9. Alexander MR, Short RD, Jones FR, Michaeli W, Blomfield CJ. Appl. Surf. Sci. 1999; 137:179.
10. Ashurst WR, Yau C, Carraro C, Lee C, Kluth GJ, Howe RT, Maboudian R. Sens. Actuators A 2001; 91: 239.
11. Angst DL, Simmons GW. Langmuir 1991; 7: 2236.
12. Li J. PhD Thesis. A Study of the Surface and Wear Properties of Silicon Based MEMS, University of Surrey, UK, 2005.
13. Maboudian R. Surf. Sci. Rep. 1998; 30: 207.
14. Wang MJ, Liechti KM, Wang Q, White JM. Langmuir 2005; 21: 1848.