Work function measurement of transition metal nitride and carbide thin films

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 832-835

  Fujii, R ^a   Gotoh, Y ^a   Liao, M Y ^a   Tsuji, H ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Cold cathode; Compound target sputtering; Electronegativity; Transition metal carbide; Transition metal nitride; Work function

Indexed keywords

COLD CATHODE TUBES; MAGNETRON SPUTTERING; NITRIDES; SILICON; TRANSITION METALS;

COLD CATHODE; COMPOUND-TARGET-SPUTTERING; ELECTRONEGATIVITY; TRANSITION METAL CARBIDE; TRANSITION METAL NITRIDE; WORK FUNCTION;

THIN FILMS;

EID: 33646588701     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.030     Document Type: Article

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