Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 358-367

  Ueno, T ^a   Okabe, Y ^a   Miwa, T ^a   Maekawa, Y ^a   Rames Langlade, G ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346615863     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch027     Document Type: Article

References (8)

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