|
|
Volumn 17, Issue 2, 2004, Pages 201-206
|
|
Positive-type photosensitive polyimide with low modulus based on soluble block copoly(imide-siloxane)
a
|
|
Author keywords
Contact angle; Low modulus block copoly(imide siloxane); Positive type photosensitive polyimide; Surface tension
|
|
Indexed keywords
1 METHYL 2 PYRROLIDINONE;
1,2 NAPHTHOQUINONE 2 DIAZIDE 5 SULFONIC ACID;
1,4 NAPHTHOQUINONE DERIVATIVE;
2 PROPANOL;
2,2 BIS(3 AMINO 4 METHYL)PHENYLHEXAFLUOROPROPANE;
2,3,4,4' TRIHYDROBENZOPHENONE;
ACID ANHYDRIDE;
BIPHENYLTETRACARBOXYLIC DIANHYDRIDE;
COPOLY(IMIDE SILOXANE);
COPOLYMER;
DIAZONAPHTHOQUINONE;
GAMMA VALEROLACTONE;
HYDROXYL GROUP;
LACTONE DERIVATIVE;
POLYIMIDE;
POLYSILOXANE;
PROPANE;
PYRIDINE;
SILICON;
SILICON WAFER;
SILOXANE;
SOLVENT;
SULFONIC ACID DERIVATIVE;
TETRAMETHYLAMMONIUM;
UNCLASSIFIED DRUG;
AQUEOUS SOLUTION;
ARTICLE;
CATALYSIS;
CHEMICAL ANALYSIS;
CHEMICAL REACTION KINETICS;
COEFFICIENT OF THERMAL EXPAND;
PHOTOSENSITIVITY;
PHYSICAL CHEMISTRY;
REACTION ANALYSIS;
ROOM TEMPERATURE;
SEMICONDUCTOR;
STRUCTURE ANALYSIS;
SYNTHESIS;
ULTRAVIOLET RADIATION;
|
|
EID: 3142628109
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.17.201 Document Type: Article |
|
Times cited : (8)
|
|
References (7)
|
