A novel low wafer stress i-line definable polyimide

Journal of Photopolymer Science and Technology

Volumn 15, Issue 2, 2002, Pages 167-172

  Sasaki, Akihiro ^a   Miyasaka, Masahiro ^a   Hiro, Masahiko ^a   Kaji, Makoto ^a  

^a Showa Denko Materials Co   (Japan)

Author keywords

i line; Low dielectric constant; Low wafer stress; Photosensitive polyimide

Indexed keywords

POLYIMIDE;

ARTICLE; DIELECTRIC CONSTANT; MEASUREMENT; PHOTOSENSITIVITY; SEMICONDUCTOR; STRESS; SYNTHESIS;

EID: 0036368723     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.167     Document Type: Article

References (6)