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Volumn 36, Issue 11, 1995, Pages 2153-2158

Positive-working alkaline-developable photosensitive polyimide precursor based on polyisoimide using diazonaphthoquinone as a dissolution inhibitor

Author keywords

dissolution behaviour; polyimide precursor; polyisoimide

Indexed keywords

ADDITION REACTIONS; CHEMICAL MODIFICATION; DISSOLUTION; ORGANIC SOLVENTS; PHOTOCHEMICAL REACTIONS; PLASTIC FILMS; SOLUBILITY; TRANSPARENCY; ULTRAVIOLET LAMPS;

EID: 0029305858     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/0032-3861(95)95290-H     Document Type: Article
Times cited : (25)

References (15)
  • 4
    • 84919257714 scopus 로고    scopus 로고
    • Moreau, W.M. and Chiong, K.N. US Patent 4880722 1989.
  • 5
    • 85022821274 scopus 로고
    • Advances in Resist Technology and Processing VI
    • Society of Photo-Optical Instrumentation Engineers, Bellingham WA
    • (1989) Proceedings of SPIE , vol.1086 , pp. 396
    • Moss1    Cuzmar2    Brewer3
  • 8
    • 84919257713 scopus 로고    scopus 로고
    • Japan Kokai Tokkyo Koho, JP 89 165622, Kanegafuti Chemical Industry Co., Ltd. 1989
  • 10
    • 84919257711 scopus 로고    scopus 로고
    • Japan Kokai Tokkyo Koho, JP 89 165 623, Kanegafuti Chemical Industry Co., Ltd, 1989
  • 12
    • 84919257709 scopus 로고    scopus 로고
    • Japan Kokai Tokkyo Koho, JP 90 294330, Chisso Corporation, 1990
  • 14
    • 84919257707 scopus 로고    scopus 로고
    • Japan Kokai Tokkyo Koho, JP 89 165622, Kanegafuti Chemical Industry Co., Ltd. 1989


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.