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Volumn 27, Issue 5, 2006, Pages 387-389

MOSFET design for forward body biasing scheme

Author keywords

Body bias; Forward bias; MOSFET; Reverse bias; Substrate bias; Work function

Indexed keywords

CMOS INTEGRATED CIRCUITS; GATES (TRANSISTOR); MOSFET DEVICES; NANOTECHNOLOGY; SEMICONDUCTOR DEVICE TESTING; SEMICONDUCTOR DOPING;

EID: 33646267440     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2006.873382     Document Type: Article
Times cited : (38)

References (7)
  • 1
    • 0033689413 scopus 로고    scopus 로고
    • "Optimum conditions of body effect factor and substrate bias in various threshold voltage MOSFETs"
    • Apr
    • H. Koura, M. Takamiya, and T. Hiramoto, "Optimum conditions of body effect factor and substrate bias in various threshold voltage MOSFETs," Jpn. J. Appl. Phys., vol. 39, no. 413, pp. 2312-2317, Apr. 2000.
    • (2000) Jpn. J. Appl. Phys. , vol.39 , Issue.413 , pp. 2312-2317
    • Koura, H.1    Takamiya, M.2    Hiramoto, T.3
  • 3
    • 21644486110 scopus 로고    scopus 로고
    • "Circuit techniques for subthreshold leakage avoidance, control, and tolerance"
    • S. Borkar, "Circuit techniques for subthreshold leakage avoidance, control, and tolerance," in IEDM Tech. Dig., 2004, pp. 421-424.
    • (2004) IEDM Tech. Dig. , pp. 421-424
    • Borkar, S.1
  • 5
    • 33646230827 scopus 로고    scopus 로고
    • "Ultralow standby power (U-LSTP) 65-nm node CMOS technology utilizing HfSiON dielectric and body-biasing scheme"
    • N. Kimizuka, Y. Yasuda, T. Iwamoto, I. Yamamoto, K. Tanaka, Y. Akiyama, and K. Imai, "Ultralow standby power (U-LSTP) 65-nm node CMOS technology utilizing HfSiON dielectric and body-biasing scheme," in VLSI Symp. Tech. Dig., 2005, pp. 218-219.
    • (2005) VLSI Symp. Tech. Dig. , pp. 218-219
    • Kimizuka, N.1    Yasuda, Y.2    Iwamoto, T.3    Yamamoto, I.4    Tanaka, K.5    Akiyama, Y.6    Imai, K.7
  • 6
    • 84945713471 scopus 로고
    • "Hot-electron-induced MOSFET degradation - Model, monitor, and improvement"
    • Feb. ED-32
    • C. Hu, S. C. Tam, F.-C. Hsu, P.-K. Ko, T.-Y. Chan, and K. W. Terrill, "Hot-electron-induced MOSFET degradation - Model, monitor, and improvement," IEEE Trans. Electron Devices, vol. ED-32, no. 2, pp. 375-385, Feb. 1985.
    • (1985) IEEE Trans. Electron Devices , Issue.2 , pp. 375-385
    • Hu, C.1    Tam, S.C.2    Hsu, F.-C.3    Ko, P.-K.4    Chan, T.-Y.5    Terrill, K.W.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.