-
1
-
-
0033689413
-
"Optimum conditions of body effect factor and substrate bias in various threshold voltage MOSFETs"
-
Apr
-
H. Koura, M. Takamiya, and T. Hiramoto, "Optimum conditions of body effect factor and substrate bias in various threshold voltage MOSFETs," Jpn. J. Appl. Phys., vol. 39, no. 413, pp. 2312-2317, Apr. 2000.
-
(2000)
Jpn. J. Appl. Phys.
, vol.39
, Issue.413
, pp. 2312-2317
-
-
Koura, H.1
Takamiya, M.2
Hiramoto, T.3
-
2
-
-
0034785112
-
"Scalability and biasing strategy for CMOS with active well bias"
-
S.-F. Huang, C. Wann, Y.-S. Huang, C.-Y. Lin, T. Schafbauer, S.-M. Cheng, Y.-C. Cheng, K.-C. Juan, D. Vietzke, M. Eller, C. Lin, Q. Ye, N. Rovedo, S. Biesemans, P. Nguyen, R. Dennard, and B. Chen, "Scalability and biasing strategy for CMOS with active well bias," in VLSI Symp. Tech. Dig., 2001, pp. 107-108.
-
(2001)
VLSI Symp. Tech. Dig.
, pp. 107-108
-
-
Huang, S.-F.1
Wann, C.2
Huang, Y.-S.3
Lin, C.-Y.4
Schafbauer, T.5
Cheng, S.-M.6
Cheng, Y.-C.7
Juan, K.-C.8
Vietzke, D.9
Eller, M.10
Lin, C.11
Ye, Q.12
Rovedo, N.13
Biesemans, S.14
Nguyen, P.15
Dennard, R.16
Chen, B.17
-
3
-
-
21644486110
-
"Circuit techniques for subthreshold leakage avoidance, control, and tolerance"
-
S. Borkar, "Circuit techniques for subthreshold leakage avoidance, control, and tolerance," in IEDM Tech. Dig., 2004, pp. 421-424.
-
(2004)
IEDM Tech. Dig.
, pp. 421-424
-
-
Borkar, S.1
-
4
-
-
4544300030
-
DD and back-bias control with reliability consideration for back-bias mode"
-
DD and back-bias control with reliability consideration for back-bias mode," in VLSI Symp. Tech. Dig., 2004, pp. 88-89.
-
(2004)
VLSI Symp. Tech. Dig.
, pp. 88-89
-
-
Togo, M.1
Fukai, T.2
Nakahara, Y.3
Koyama, S.4
Makabe, M.5
Hasegawa, E.6
Nagase, M.7
Matsuda, T.8
Sakamoto, K.9
Fujiwara, S.10
Goto, Y.11
Yamamoto, T.12
Mogami, T.13
Ikeda, M.14
Yamagata, Y.15
Imai, K.16
-
5
-
-
33646230827
-
"Ultralow standby power (U-LSTP) 65-nm node CMOS technology utilizing HfSiON dielectric and body-biasing scheme"
-
N. Kimizuka, Y. Yasuda, T. Iwamoto, I. Yamamoto, K. Tanaka, Y. Akiyama, and K. Imai, "Ultralow standby power (U-LSTP) 65-nm node CMOS technology utilizing HfSiON dielectric and body-biasing scheme," in VLSI Symp. Tech. Dig., 2005, pp. 218-219.
-
(2005)
VLSI Symp. Tech. Dig.
, pp. 218-219
-
-
Kimizuka, N.1
Yasuda, Y.2
Iwamoto, T.3
Yamamoto, I.4
Tanaka, K.5
Akiyama, Y.6
Imai, K.7
-
6
-
-
84945713471
-
"Hot-electron-induced MOSFET degradation - Model, monitor, and improvement"
-
Feb. ED-32
-
C. Hu, S. C. Tam, F.-C. Hsu, P.-K. Ko, T.-Y. Chan, and K. W. Terrill, "Hot-electron-induced MOSFET degradation - Model, monitor, and improvement," IEEE Trans. Electron Devices, vol. ED-32, no. 2, pp. 375-385, Feb. 1985.
-
(1985)
IEEE Trans. Electron Devices
, Issue.2
, pp. 375-385
-
-
Hu, C.1
Tam, S.C.2
Hsu, F.-C.3
Ko, P.-K.4
Chan, T.-Y.5
Terrill, K.W.6
-
7
-
-
0031103046
-
"Dynamic threshold-voltage MOSFET (DTMOS) for ultralow voltage VLSI"
-
Mar
-
F. Assaderaghi, D. Sinitsky, S. A. Parke, J. Bokor, P. K. Ko, and C. Hu, "Dynamic threshold-voltage MOSFET (DTMOS) for ultralow voltage VLSI," IEEE Trans. Electron Devices, vol. 44, no. 3, pp. 414-422, Mar. 1997.
-
(1997)
IEEE Trans. Electron Devices
, vol.44
, Issue.3
, pp. 414-422
-
-
Assaderaghi, F.1
Sinitsky, D.2
Parke, S.A.3
Bokor, J.4
Ko, P.K.5
Hu, C.6
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