The role of few-asperity contacts in adhesion

Journal of Colloid and Interface Science

Volumn 298, Issue 1, 2006, Pages 94-101

  Thoreson, E J ^a   Martin, J ^b   Burnham, N A ^a  

^a Worcester Polytechnic Institute   (United States)

^b ANALOG DEVICES INC   (United States)

Author keywords

Adhesion; AFM; Particle deposition; Silicon dioxide; Surface forces; Surface roughness; Van der Waals forces; Work of adhesion

Indexed keywords

ATOMIC FORCE MICROSCOPY; SILICA; SURFACE CHEMISTRY; SURFACE ROUGHNESS; VAN DER WAALS FORCES;

PARTICLE DEPOSITION; SURFACE FORCES; WORK OF ADHESION;

ADHESION;

DIPHENYLSILOXANE; SILICON; SILICON DIOXIDE; SILOXANE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CALCULATION; CRYSTAL; DENSITY; MECHANICS; MICROSCOPE; PREDICTION; PRIORITY JOURNAL; RELIABILITY; SURFACE PROPERTY;

EID: 33646133421     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2005.11.054     Document Type: Article

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