Non-destructive high-resolution X-ray imaging of ULSI micro-electronics using keV X-ray microscopy in Zernike phase contrast

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1043-1046

  Neuhäusler, Ulrich ^a   Schneider, Gerd ^b  

^a BIELEFELD UNIVERSITY   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Fresnel zone plates; Non destructive X ray imaging; ULSI microelectronics; X ray microscopy; Zernike phase contrast

Indexed keywords

MICROELECTRONICS; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY MICROSCOPES;

FRESNEL ZONE PLATES; NON-DESTRUCTIVE X-RAY IMAGING; ULSI MICROELECTRONICS; ZERNIKE PHASE CONTRAST;

ULSI CIRCUITS;

EID: 33646057725     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.225     Document Type: Article

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5. Neuhäusler U., and Schneider G. AIP Conf. Proc. 705 1 (2004) 1255
6. Neuhäusler U., Schneider G., Ludwig W., and Hambach D. J. Phys. IV France 104 (2003) 567
7. Schneider G., Denbeaux G., Anderson E., Bates B., Pearson A., Meyer M., Zschech E., Hambach D., and Stach E. Appl. Phys. Lett. 81 (2002) 2535