Ion beam imprinting system for nanofabrication

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 796-799

  Ji, Qing ^a   Chen, Ye ^a,b   Ji, Lili ^a,b   Jiang, Ximan ^a,b   Leung, Ka Ngo ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Etcheverry Hall MCI 730   (United States)

Author keywords

Ion beam imprinting; Nanofabrication; Nanopores; Plasma assisted thin film deposition

Indexed keywords

ARRAYS; MEMBRANES; MICROMETERS; NANOTECHNOLOGY;

ION BEAM IMPRINTING; NANOPORES; PLASMA-ASSISTED THIN FILM DEPOSITION; PLASMA-ASSISTED THIN-FILM DEPOSITION;

ION BEAMS;

EID: 33646032414     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.094     Document Type: Article

References (9)

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9. X. Jiang, K.-N. Leung, Abstract Proceddings of the 49th International Conference on Electron, Ion, and Photon beam Technology and Nanofabrication, 2005, pp. 311.