Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

Journal of Optoelectronics and Advanced Materials

Volumn 8, Issue 1, 2006, Pages 71-73

  Vladoiu, R ^a   Ciupina, V ^a   Lungu, C P ^b   Bursikova, V ^c   Musa, G ^a,b  

^a OVIDIUS UNIVERSITY   (Romania)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c MASARYK UNIVERSITY   (Czech Republic)

Author keywords

AFM; HRTEM; Nano intendation; Thermo ionic vacuum arc; Tungsten thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; FRICTION; GRAIN SIZE AND SHAPE; INDENTATION; TRANSMISSION ELECTRON MICROSCOPY; TRANSMISSIONS; TUNGSTEN METALLOGRAPHY; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

COEFFICIENT OF FRICTIONS; DEPTH SENSING INDENTATION; GRAIN SIZE DISTRIBUTION; HRTEM; NANO-INTENDATION; SELECTED AREA DIFFRACTION; TUNGSTEN THIN FILMS; VACUUM ARCS;

THIN FILMS;

EID: 33646015094     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (8)

1. G. Musa, H. Ehrich, M. Mausbac, J. Vac. Sci. and Techn. A12, 2887 (1994).
2. G. Musa, I. Mustata, A. Popescu, H. Ehrich, J. Schumann, Thin Solid Films 333, 95 (1998).
3. H. Ehrich, J. Schuhmann, G. Musa, A. Popescu, I. Mustata, Thin Solid films 333, 95 (1998).
4. G. Musa, I. Mustata, V. Ciupina, R. Vladoiu, G. Prodan, C. P. Lungu, H. Ehrich, J. Optoelectron. Adv. Mater. 7(5), 2485 (2005).
5. T. Akan, N. Ekem, S. Pat, R. Vladoiu, G. Musa, J. Optoelectron. Adv. Mater. 7(5), 2489 (2005).
6. S. Pat, N. Ekem, T. Akan, O. Kusmus, S. Demirkol, R. Vladoiu, C. P. Lungu, G. Musa, J. Optoelectron. Adv. Mater. 7(5), 2495 (2005).
7. G. Musa, I. Mustata, V. Ciupina, R. Vladoiu, G. Prodan, E. Vasile, H. Ehrich, Diamond and Related Materials 13(4-8), 1398 (2004).
8. C. P. Lungu, I. Mustata, G. Musa, A. M. Lungu, V. Zaroschi, K. Iwasaki, Y. Matsumura, R. Tanaka, I. Iwanaga, H. Tanaka, T. Oi, K. Fujita, Proceedings of PSE 2004, Germany, 1-5 Sept 2004, p. 33 (2004).