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Volumn 88, Issue 14, 2006, Pages

Cryogenic two-photon laser photolithography with SU-8

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CRYOGENICS; PHOTONS; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR QUANTUM DOTS; SPECTROSCOPIC ANALYSIS;

EID: 33645690107     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2194311     Document Type: Article
Times cited : (7)

References (13)
  • 6
    • 0035899361 scopus 로고    scopus 로고
    • H.-B. Sun, T. Kawakami, Y. Xu, J.-Y. Ye, S. Matuso, H. Misawa, M. Miwa, and R. Kaneko, Opt. Lett. 0146-9592 25, 1110 (2000); S. Kawata, H.-B. Sun, T. Tanaka, and K. Takada, Nature (London) 412, 697 (2001).
    • (2001) Nature (London) , vol.412 , pp. 697
    • Kawata, S.1    Sun, H.-B.2    Tanaka, T.3    Takada, K.4
  • 7
    • 0001059982 scopus 로고    scopus 로고
    • 0003-6951 10.1063/1.123367
    • H.-B. Sun, S. Matsuo, and H. Misawa, Appl. Phys. Lett. 0003-6951 10.1063/1.123367 74, 786 (1999); M. Deubel, G. von Freymann, M. Wegener, S. Pereira, K. Busch, and C. M. Soukoulis, Nat. Mater. 3, 444 (2004).
    • (1999) Appl. Phys. Lett. , vol.74 , pp. 786
    • Sun, H.-B.1    Matsuo, S.2    Misawa, H.3
  • 11
    • 0003852994 scopus 로고
    • Plenum, New York
    • We have experimented with Novolak positive photoresists Shipley S1818 and S1805 and have been unable to expose them successfully at low temperatures (4 or 100 K) using single-photon or two-photon excitation. These photoresists require the presence of water, usually adsorbed from the laboratory air. Other positive photoresists that work on the principle of photoinduced polymer chain scission may be suitable for low-temperature lithography. See W. M. Moreau, Semiconductor Lithography: Principles, Practices, and Materials (Plenum, New York, 1988).
    • (1988) Semiconductor Lithography: Principles, Practices, and Materials
    • Moreau, W.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.