Combinatorial arc plasma deposition of thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 4 A, 2006, Pages 2708-2713

  Hata, Seiichi ^a   Yamauchi, Ryusuke ^a   Sakurai, Junpei ^a   Shimokohbe, Akira ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous; Arc plasma; Combinatorial deposition; Pd Cu Si alloy; Thin film

Indexed keywords

ALLOYS; AMORPHOUS MATERIALS; ANALYSIS; CATHODES; CRYSTALS; DEPOSITION; LIBRARIES; MAGNETIC FIELDS; MEASUREMENTS; PLASMA GUNS; SUBSTRATES; THIN FILMS;

AMORPHOUS; COMBINATORIAL ARC PLASMA DEPOSITION (CAPD); ENERGY-DISPERSIVE X-RAY FLUORESCENCE SPECTROMETER (EDX); IMAGING-PLATE X-RAY DIFFRACTOMETER (IP-XRD); PD-CU-SI ALLOY; TIME INTERVAL;

PLASMA WELDING;

EID: 33645686969     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2708     Document Type: Article

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