Effective light absorptive layer-using mezo-porous silicon by electrochemical etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 4 A, 2006, Pages 2875-2880

  Kwon, Jae Hong ^a   Lee, Soo Hong ^a,b   Ju, Byeong Kwon ^a  

^a Korea University   (South Korea)

^b Sejong University   (South Korea)

Author keywords

Antireflective layer; Electrochemical etching; Porous silicon; Solar cell

Indexed keywords

ANODIC OXIDATION; ANTIREFLECTION COATINGS; ETCHING; ETHANOL; POROUS SILICON; SILICON WAFERS; SOLAR CELLS;

ANTIREFLECTIVE LAYERS; ELECTROCHEMICAL ETCHING (ECE); POTASSIUM HYDROXIDE (KOH); WEIGHTED REFLECTANCE;

LIGHT ABSORPTION;

EID: 33645658775     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2875     Document Type: Article

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