Antireflective porous-silicon coatings for multicrystalline solar cells: The effects of chemical etching and rapid thermal processing

Semiconductor Science and Technology

Volumn 16, Issue 8, 2001, Pages 657-661

  Martin Palma R J ^a,b   Vazquez L ^b   Martinez Duart J M ^a,b   Schnell, M ^c   Schaefer, S ^c  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ETCHING; MORPHOLOGY; NITROGEN; OPTICAL PROPERTIES; OXYGEN; POROUS SILICON; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SILICON SOLAR CELLS; THERMAL EFFECTS;

ANTIREFLECTIVE POROUS-SILICON COATINGS; MULTICRYSTALLINE SOLAR CELL; SILICON EMITTER; STAIN-ETCHED POROUS SILICON;

ANTIREFLECTION COATINGS;

EID: 0035421068     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/16/8/303     Document Type: Article

References (11)