Preparation of a single layer of luminescent nanocrystalline Si structures by laser irradiation method

Chinese Physics Letters

Volumn 23, Issue 4, 2006, Pages 1029-1031

  Cen, Zhan Hong ^a   Xu, Jun ^a   Liu, Yan Song ^a   Han, Pei Gao ^a   Li, Wei ^a   Huang, Xin Fan ^a   Chen, Kun Ji ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; EXCIMER LASERS; FLUORINE COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IRRADIATION; NANOCRYSTALLINE SILICON; ULTRATHIN FILMS;

AMORPHOUS SI FILMS; AREA DENSITY; EXCIMER LASER ANNEALING; IRRADIATION METHODS; KRF EXCIMER LASER; LASER FLUENCES; NANO GRAINS; NANOCRYSTALLINE SI; SINGLE LAYER; ULTRA-THIN;

NANOCRYSTALS;

EID: 33645551759     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/4/074     Document Type: Article

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