Explicit expression on specifications of mask mean to target and mask uniformity

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 634-638

  Lee, Sung Woo ^a   Lee, Doo Youl ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; LINEAR EQUATIONS; SPECIFICATIONS;

MASK ERROR ENHANCEMENT FACTORS (MEEF); MASK MEAN TO TARGET (MTT);

MASKS;

EID: 33645511204     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2172250     Document Type: Article

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