Electron field-emission properties of Ag-SiO2 nanocomposite layers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 958-961

  Tsang, W M ^a   Stolojan, V ^a   Giusca, C ^a   Poa, C H P ^a   Sealy, B ^a   Silva, S R P ^a   Wong, S P ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON EMISSION; ION IMPLANTATION; OXIDATION; SILICATES; SILVER; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRICAL INHOMOGENEITY; FIELD EMISSION PROPERTIES; FIELD-ENHANCEMENT MECHANISMS; NANOCLUSTERS;

NANOSTRUCTURED MATERIALS;

EID: 33645504199     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2165669     Document Type: Article

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