Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 629-633

  Arai, N ^a,b   Tsuji, H ^a   Motono, M ^a   Gotoh, Y ^a   Adachi, K ^b   Kotaki, H ^b   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

Metal nanoparticle; Negative ion implantation; Oxide film

Indexed keywords

ION IMPLANTATION; NEGATIVE IONS; SILICA; SILVER; TRANSMISSION ELECTRON MICROSCOPY;

OXIDE FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0038751670     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00801-2     Document Type: Conference Paper

References (13)

1. Yano K., Ishii T., Hashimoto T., Kobayashi T., Murai F., Seki K. IEEE Trans. ED 41:1994;1628.
2. Nakajima A., Futatsugi T., Horiguchi N., Nakao H., Yokoyama N. Tech. Dig. IEDM. 1997;159.
3. Ishikawa J., Tsuji H., Toyota Y., Gotoh Y., Matsuda K., Tanjo T., Sasaki S. Nucl. Instr. and Meth. B. 96:1995;7.
4. Tsuji H., Toyota Y., Ishikawa J., Sasaki S., Okayama Y., Nagumo S., Gotoh Y., Matsuda K. Ion Implantation Technology-94. 1995;Elsevier, New York. p. 612.
5. Tsuji H., Gotoh Y., Ishikawa J. Nucl. Instr. and Meth. B. 141:1998;645.
6. Tsuji H., Satoh H., Ikeda S., Gotoh Y., Ishikawa J. Nucl. Instr. and Meth. B. 141:1998;197.
7. Tsuji H., Ishikawa J., Itoh H., Toyota Y., Gotoh Y. Appl. Surf. Sci. 100-101:1996;342.
8. Kishimoto N., Umeda N., Takeda Y., Lee C.G., Gritsyna V.T. Nucl. Instr. and Meth. B. 148:1999;1017.
9. Tsuji H., Kido S., Sasaki H., Gotoh Y., Ishikawa J. Rev. Sci. Instr. 71:2000;804.
10. Tsuji H., Ishikawa J. Rev. Sci. Instr. 63:1992;2488.
11. Tsuji H., Ishikawa J., Gotoh Y., Okada Y. AIP Conf. Proc. 287:1994;530.
12. Biersack J.P. Nucl. Instr. and Meth. B. 27:1987;21.
13. Mie G. Ann. Phys. 25:1908;377. [blank_line]