Optical spatial heterodyned interferometry for applications in semiconductor inspection and metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6162, Issue , 2006, Pages

  Tobin, Kenneth W ^a   Bingham, Philip R ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Holography; MEMS characterization; Photolithographic mask metrology; Semiconductor wafer inspection; Spatial Heterodyned Interferometry

Indexed keywords

HOLOGRAPHY; IMAGE CODING; INSPECTION; MEASUREMENTS; MICROELECTROMECHANICAL DEVICES; OPTICAL MICROSCOPY; PHASE SHIFT; TOPOLOGY;

MEMS CHARACTERIZATION; PHOTOLITHOGRAPHIC MASK METROLOGY; SEMICONDUCTOR WAFER INSPECTION; SPATIAL HETERODYNED INTERFEROMETRY;

INTERFEROMETRY;

EID: 33645399310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.674946     Document Type: Conference Paper

References (10)

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