Phase defect detection with spatial heterodyne interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 18-28

  Bingham, Philip R ^a   Tobin, Kenneth W ^a   Bennett, Marylyn H ^b   Marmillion, Pat ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

Mask Inspection; Phase Defects; Spatial Heterodyne Interferometry

Indexed keywords

MASK INSPECTION; PHASE DEFECTS; PHASE SHIFT MASKS (PSM); SPATIAL HETERODYNE INTERFEROMETRY (SHI);

ALGORITHMS; CAMERAS; IMAGING SYSTEMS; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS; WAVEFRONTS;

INTERFEROMETRY;

EID: 4344565373     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536765     Document Type: Conference Paper

References (8)

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