Wavefront Coded® Imaging Systems for MEMS Analysis

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2002, Pages 295-303

  Barton, Daniel L ^a   Walraven, Jeremy A ^a   Dowski Jr , Edward R ^b   Danz, Rainer ^c   Faulstich, Andreas ^c   Faltermeier, Bernd ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b CDM Optics Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONFOCAL IMAGING; NOISE FILTERS; SCANNING OPTICAL MICROSCOPY (SOP);

ALGORITHMS; CANTILEVER BEAMS; DIGITAL FILTERS; ELECTROSTATICS; FAILURE ANALYSIS; IMAGE QUALITY; LIGHT REFLECTION; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; MICROSCOPES; OPTICAL MICROSCOPY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SIGNAL PROCESSING; THIN FILMS;

IMAGING SYSTEMS;

EID: 0142164795     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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11. S. C. Tucker, W. T. Cathey, and E. R. Dowski, Jr., "Extended depth of field and aberration control for inexpensive digital microscope systems," Optics Express, vol. 4, no. 11, 24 May 1999.