Characteristics of a micro-plasma produced by atmospheric pressure RF impulse discharge using coaxial micro-electrode

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 436-439

  Tanaka, Yasuhiro ^a   Iizuka, Satoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Atmospheric pressure discharge; Micro plasma; RF impulse discharge

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC BREAKDOWN; MICROELECTRODES; SURFACE DISCHARGES; SURFACE TREATMENT;

ATMOSPHERIC PRESSURE DISCHARGE; COAXIAL MICRO-ELECTRODE; FLOW RATE; MICRO-PLASMA; RF IMPULSE;

PLASMAS;

EID: 33645235690     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.034     Document Type: Conference Paper

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