Development of the RF plasma source at atmospheric pressure

Surface and Coatings Technology

Volumn 171, Issue 1-3, 2003, Pages 144-148

  Kang, Jung G ^a   Kim, Hyoung S ^a   Ahn, Sung W ^a   Uhm, Han S ^a  

^a Ajou University   (South Korea)

Author keywords

Asymmetric biaxial reactor; Atmospheric; Dielectric; RF plasma

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRODES; EMISSION SPECTROSCOPY; GASES; HELIUM;

COAXIAL ELECTRODES;

PLASMAS;

ATMOSPHERIC EFFECT; DIELECTRIC PROPERTY; PLASMA; REACTOR;

EID: 0038382937     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00258-5     Document Type: Article

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