Characterisations of atmospheric pressure ejected plasma sources

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 535-540

  Kim, Yong Hwan ^a   Choi, Yoon Ho ^a   Kim, Ji Hun ^a   Park, Jong Kyu ^a   Ju, Won Tae ^a   Paek, Kwang Hyun ^a   Hwang, Yong Seok ^a  

^a Seoul National University   (South Korea)

Author keywords

Atmospheric pressure ejected plasma; Gas temperature; OES; Radical density

Indexed keywords

ATMOSPHERIC PRESSURE; DECONTAMINATION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; FLOW OF FLUIDS; SURFACE TREATMENT;

OPTICAL EMISSION SPECTROSCOPY (OES);

PLASMA SOURCES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18244418839     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00412-2     Document Type: Article

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