Optimization of TEM specimen preparation by double-sided ion beam thinning under low angles

Journal of Electron Microscopy

Volumn 48, Issue 3, 1999, Pages 235-244

  Strecker, A ^a   Mayer, J ^a   Baretzky, B ^a   Eigenthaler, U ^a   Gemming, Th ^a   Schweinfest, R ^a   Ruhle M ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Ion beam thinning; TEM specimen preparation

Indexed keywords

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; ION BEAMS; ION BOMBARDMENT; SPECIMEN PREPARATION; SURFACE DEFECTS;

ANGLE OF INCIDENCE; ATOMIC-FORCE-MICROSCOPY; CENTER OF ROTATION; DOUBLE SIDED; ION BEAM THINNING; OPTIMISATIONS; RADIATION-INDUCED DAMAGES; SPECIAL SPECIMENS; SPECIMEN GEOMETRY; TEM SPECIMEN PREPARATION;

SURFACE ROUGHNESS;

EID: 0033047449     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/oxfordjournals.jmicro.a023673     Document Type: Article

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