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Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 1009-1014

Formation of nano-crystalline Si by thermal annealing of SiOx, SiCx and SiOyCx amorphous alloys: Model systems for advanced device processing

(2) Wolfe, D M a Lucovsky, G a

a NORTH CAROLINA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003105195 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(99)00894-7 Document Type: Article

Times cited : (9)

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