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Surface and Coatings Technology

Volumn 200, Issue 18-19, 2006, Pages 5203-5209

Characterization of cobalt thin films electrodeposited onto silicon with two different resistivities

(3) Manhabosco, Taíse Matte a,b Englert, G a Muller I L a

a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL (Brazil)

b NONE (Brazil)

Author keywords

Cobalt; Electroplating; Nucleation; Silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROPLATING; GALVANIZING; MORPHOLOGY; NUCLEATION; SILICON; THIN FILMS;

COBALT THIN FILMS; GALVANOSTATIC DEPOSITION; TWO-STEP NUCLEATION;

COBALT;

ATOMIC FORCE MICROSCOPY; COBALT; ELECTROPLATING; GALVANIZING; MORPHOLOGY; NUCLEATION; SILICON; THIN FILMS;

EID: 33645102458 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.06.005 Document Type: Article

Times cited : (16)

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