Large area rotating cylindrical magnetron sputtering: Magnet system enhancements

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 275-279

  Blondeel, A ^a   Van Nuffel, R ^a   De Bosscher, W ^a   Dellaert, K ^a   Broche R ^a   Fourneau, N ^a  

^a Bekaert sa   (Belgium)

Author keywords

Magnet array; Magnetrons; Reactive deposition; Sputter deposition

Indexed keywords

OPTIMIZATION; SPUTTER DEPOSITION; THIN FILMS;

MAGNET ARRAY; REACTIVE DEPOSITION;

MAGNETRON SPUTTERING;

EID: 33644969301     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. W. De Bosscher, H. Delrue, Steven Matthews, J. Van Holsbeke, A. Blondeel, "Rotating cylindrical ITO targets for large area coating", 48th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2005.
2. K. Dellaert, J. De Boever, S. Porteman and W. De Bosscher, "Advances in sputter hardware for rotating cylindrical magnetron sputtering", 48th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2005.
3. P. Sieck, "Effect of anode location on deposition profiles for long rotatable magnetrons", 37th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 233, 1994.
4. G. Buyle, D. Depla, K. Eufinger, W. De Bosscher, R. De Gryse, "Monte Carlo Simulation of Anomalous Erosion in Large Area Sputter Magnetrons", 48th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2005.
5. W. De Bosscher, A. Blondeel, G. Buyle. "Uniformity Control in Sputter Deposition Processes", 45th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 135, 2002.
6. A. Blondeel, W. De Bosscher, "Rotating cylindrical magnetron sputtering: aspects influencing the sputter deposition yield in large area coating applications", 46th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 248, 2003.