Advances in sputter hardware for rotating cylindical magnetron sputtering

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 270-274

  Dellaert, K ^a   De Boever, J ^a   Porteman, S ^a   De Bosscher, W ^a  

^a Bekaert sa   (Belgium)

Author keywords

Display coater; End block; Magnetron; Sputter deposition

Indexed keywords

ELECTRIC CURRENTS; POWER TRANSMISSION; SPUTTER DEPOSITION; THIN FILMS;

DISPLAY COATER; END BLOCK;

MAGNETRON SPUTTERING;

EID: 33644990870     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. W. De Bosscher, D. Cnockaert, and H. Lievens, "Advances in Cilindrical Magnetrons", 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 156, 1999.
2. W. De Bosscher, H. Delrue, J. Van Holsbeke, S. Matthews, A. Blondeel, "Rotating Cylindrical ITO Targets for Large Area Coating", 48th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2005.
3. A. Blondeel, K. Dellaert, R. Van Nuffel, N. Fourneau, R. Broché and W. De Bosscher, "Large Area Rotating Cylindrical Magnetron Sputtering: Magnetic System Enhancements", 48th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2005.
4. J. Rietzel and S. Nadel, "Enhancements to Rotating Cylindrical Magnetrons", 47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 224, 2004.