Spatial variation of plasma parameters and ion acceleration in an inductive plasma system

Journal of Applied Physics

Volumn 99, Issue 4, 2006, Pages

  Volynets, V N ^a   Park, Wontaek ^a   Tolmachev, Yu N ^a   Pashkovsky, V G ^a   Yoo, Jinwoo ^b  

^a SAMSUNG Electronics   (South Korea)

^b Korea Advanced Nano Fab Center (KANC)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC FIELD EFFECTS; ELECTRONS; KINETIC ENERGY; PLASMA SOURCES;

ION ACCELERATION; ION ENERGY DISTRIBUTION; PLASMA POTENTIAL;

INDUCTIVELY COUPLED PLASMA;

EID: 33644607480     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2170419     Document Type: Article

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