Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering

Chinese Physics Letters

Volumn 23, Issue 3, 2006, Pages 682-685

  Jing, Shi Wei ^a,b   Liu, Yi Chun ^b   Liang, Yu ^b   Ma, Jian Gang ^b   Lu, You Ming ^b   Shen, De Zhen ^b   Zhang, Ji Ying ^b   Fan, Xi Wu ^b   Mu, Ri Xiang ^c  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b NORTHEAST NORMAL UNIVERSITY   (China)

^c FISK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW OF GASES; LIGHT ABSORPTION; MAGNETRON SPUTTERING; PHOTOELECTRONS; PHOTONS; RATE CONSTANTS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS FLOWRATE; METAL DISK; N CONTENT; QUARTZ SUBSTRATE; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING METHOD; SUBSTRATES TEMPERATURE; THIN-FILMS; TITANIUM METALS; X-RAY PHOTOELECTRONS;

TITANIUM DIOXIDE;

EID: 33644599314     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/3/044     Document Type: Article

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