High performance photomask cleaning process using electrolyzed water

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 395-404

  Nagamura, Y ^a   Usui, H ^b   Yoshioka, N ^a   Morimoto, H ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b Wacom Electric Co Ltd   (Japan)

Author keywords

Electrolyzed water; Megasonic scrubbing; MoSiON film; Particle removing; Phase shift mask; Photomask cleaning process; Reduction of chemicals consumption; SC 1; Spin mask cleaner

Indexed keywords

AMMONIUM COMPOUNDS; CATHODES; CHEMICAL CLEANING; COMPOSITION EFFECTS; ELECTROLYSIS; PARTICLES (PARTICULATE MATTER); REMOVAL; SULFURIC ACID; SURFACE PHENOMENA; THERMAL EFFECTS; WATER;

ALKALINE CATHODE WATER; MEGASONIC SCRUBBING; PHASE SHIFT MASK; PHOTOMASK CLEANING;

MASKS;

EID: 0006731536     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328853     Document Type: Conference Paper

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