Deposition conditions for large area PECVD of amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 591-595

  Kuske, J ^a   Stephan, U ^a   Nowak, W ^a   Roehlecke, S ^a   Kottwitz, A ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRODES; PLASMAS; PRESSURE;

FILM THICKNESS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

AMORPHOUS FILMS;

EID: 0031331846     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-591     Document Type: Conference Paper

References (6)