Photon-stimulated desorption from chlorinated Si(111): Etching of SiCl by picosecond-pulsed laser irradiation

Physical Review B - Condensed Matter and Materials Physics

Volumn 73, Issue 8, 2006, Pages

  Kirimura, Tomoyuki ^a,b   Shudo, Ken Ichi ^a,b   Hayashi, Yujiro ^b   Tanaka, Yoshihito ^b   Ishikawa, Tetsuya ^b   Tanaka, Masatoshi ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b RIKEN Harima Institute Research   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33244461953     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.73.085309     Document Type: Article

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