Population analysis study of etching processes at Si(100) surfaces with adsorbed halogens and hydrogens

Surface Science

Volumn 438, Issue 1-3, 1999, Pages 18-25

  Aizawa, Hideaki ^a   Tsuneyuki, Shinji ^a   Ogitsu, Tadashi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BROMINE; CHEMICAL BONDS; CHEMISORPTION; CHLORINE; ELECTRONIC STRUCTURE; ETCHING; HYDROGEN; PROBABILITY DENSITY FUNCTION; SCANNING TUNNELING MICROSCOPY;

BOND CHARGE; DENSITY FUNCTIONAL CALCULATIONS; POPULATION ANALYSIS; REPULSIVE INTERACTION;

SEMICONDUCTING SILICON;

EID: 0033319286     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00539-7     Document Type: Article

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