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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 4, 2002, Pages 2171-2175

Electronic structures and etching processes of chlorinated Si(111) surfaces

(2) Sakurai, Shogo a Nakayama, Takashi a

a CHIBA UNIVERSITY (Japan)

Author keywords

Activa tion energy; Chlorine; Collision; Dichloride; Etching; Evaporation; Monochloride; Si(111) surface; Trichloride

Indexed keywords

ACTIVATION ENERGY; CHLORINATION; COMPUTER AIDED SOFTWARE ENGINEERING; DESORPTION; ELECTRONIC STRUCTURE; ETCHING; EVAPORATION; PROBABILITY DENSITY FUNCTION; SURFACE TREATMENT;

DENSITY FUNCTIONAL THEORY; DICHLORIDE; DIMER-ADATOM-STACKING FAULT STRUCTURE; FIRST PRINCIPLES CALCULATIONS; MONOCHLORIDE; TOKYO AB INITIO PROGRAM PACKAGE CODE;

SEMICONDUCTING SILICON;

EID: 0036529347 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.2171 Document Type: Article

Times cited : (25)

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