Photoetching of Si(111)-(7 x 7) studied by STM

Surface Science

Volumn 376, Issue 1-3, 1997, Pages 77-86

  Chen, X H ^a   Polanyi, J C ^a   Rogers, D ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

Chemisorption; Chlorine; Etching; Laser annealing; Photochemistry; Scanning tunnelling microscopy; Silicon; Single crystal surfaces

Indexed keywords

ANNEALING; ATOMS; CHEMISORPTION; CHLORINATION; ETCHING; PHOTOLYSIS; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; STATISTICAL METHODS; SURFACE PHENOMENA; SURFACE TREATMENT;

ADATOMS; PHOTOETCHING;

SEMICONDUCTING SILICON;

EID: 0031117387     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01403-3     Document Type: Article

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