Diagnostic by emission spectroscopy of an argon-hydrogen RF inductive thermal plasma for purification of metallurgical grade silicon

Journal of Physics D: Applied Physics

Volumn 37, Issue 21, 2004, Pages 2966-2974

  Benmansour, M ^a   Nikravech, M ^a   Morvan, D ^a   Amouroux, J ^a   Chapelle, J ^b  

^a PSL RESEARCH UNIVERSITY   (France)

^b UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; EVAPORATION; HYDROGEN; PARAMETER ESTIMATION; PLASMAS;

IN-FLIGHT PURIFICATION; LIQUID DROPLETS; TEMPERATURE PROFILES; THERMAL PLASMAS;

SILICON;

EID: 9144232499     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/21/005     Document Type: Article

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