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Volumn 20, Issue 3, 2004, Pages 189-195

Industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating

Author keywords

Closed field unbalanced magnetron sputter ion plating; Pulsed dc bias power; Sputter precleaning

Indexed keywords

COATINGS; DIELECTRIC MATERIALS; DIFFUSION; ELECTRIC POTENTIAL; IONS; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; PLATING; POWER SUPPLY CIRCUITS; STEEL; SUBSTRATES;

EID: 3242705846     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708404225016373     Document Type: Conference Paper
Times cited : (9)

References (20)
  • 9
    • 3242740667 scopus 로고    scopus 로고
    • US Patent 5,556,519, 17 September
    • D. G. TEER: US Patent 5,556,519, 17 September, 1996.
    • (1996)
    • Teer, D.G.1
  • 18
    • 1342299985 scopus 로고    scopus 로고
    • April Advanced Energies Industries, Inc., Fort Collins, CO, USA
    • Advanced Energies Inc.: 'Pinnacle™ Plus user manual'; April 2000, Advanced Energies Industries, Inc., Fort Collins, CO, USA.
    • (2000) Pinnacle™ Plus User Manual


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.