Metalorganic chemical vapor deposition of epitaxial perovskite SrIrO 3 films on (100)SrTiO3 substrates

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 1-3, 2006, Pages

  Kim, Yong Kwan ^a   Sumi, Akihiro ^a   Takahashi, Kenji ^a   Yokoyama, Shintaro ^a   Ito, Shinichi ^a   Watanabe, Takayuki ^a   Akiyama, Kensuke ^b   Kaneko, Satoru ^b   Saito, Keisuke ^c   Funakubo, Hiroshi ^a,d  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c BRUKER AXS INC   (United States)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Conductive oxide; Epitaxy; MOCVD; Perovskite SrIrO3; Thin film

Indexed keywords

CRYSTAL STRUCTURE; EPITAXIAL GROWTH; LATTICE CONSTANTS; PEROVSKITE; THERMAL EFFECTS; THIN FILMS;

ATOMICALLY FLAT SURFACES; CONDUCTIVE OXIDES; MECHANICAL CONSTRAINTS; PEROVSKITE SRIRO3;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 32044454706     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L36     Document Type: Article

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