Optically variable micro-mirror arrays fabricated by graytone lithography

Microelectronic Engineering

Volumn 83, Issue 2, 2006, Pages 351-356

  Leech, Patrick W ^a   Lee, Robert A ^a  

^a CSIRO   (Australia)

Author keywords

Graytone lithography; Micro mirror arrays; Optically variable devices

Indexed keywords

IMAGE CODING; LIGHT MODULATION; MASKS; MICROOPTICS; OPTICAL FIBER FABRICATION; PHOTOLITHOGRAPHY; TRANSPARENCY;

GRAYTONE LITHOGRAPHY; MICRO-MIRROR ARRAYS; OPTICALLY VARIABLE DEVICES; OPTICALLY VARIABLE EFFECTS;

MIRRORS;

EID: 32044452179     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.10.002     Document Type: Article

References (7)

1. R.L. van Renesse Optical Document Security third ed. 2005 Artech House London
2. R.A. Lee Microelectron. Eng. 61-62 2002 105
3. P.W. Leech, and H. Zeidler Microelectron. Eng. 65 2003 439
4. C. Gimkiewicz, D. Hagedorn, J. Jahns, E-B. Kley, and F. Thoma Appl. Opt. 38 14 1999 2986
5. K. Reimer, R. Engelke, U. Hofmann, P. Mertz, K.T. Kohlmann, B. Wagner, in: MF-Conference, Micromachine Technology for Diffractive and Holographic Optics, SPIE vol. 3879, Santa Clara, (1999) p. 98.
6. D.R. Purdy, and L.G. Hipworth GEC J. Res. 13 3 1996 159
7. M. Hechele, and W.K. Schomburg J. Micromech. Microeng. 14 2004 R1