Microrelief structures for anti-counterfeiting applications

Microelectronic Engineering

Volumn 65, Issue 4, 2003, Pages 439-446

  Leech, Patrick W ^a   Zeidler, Henning ^b  

^a CSIRO   (Australia)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electron beam lithography; Greytone lithography; Micro relief structures

Indexed keywords

COATINGS; LITHOGRAPHY; MASKS; MICROSTRUCTURE;

MICRORELIEF STRUCTURES;

MICROELECTRONICS;

EID: 0037961581     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00162-X     Document Type: Article

References (10)

1. Reimer K., Hoffman U., Jurss M., Pilz W., Quenzer H.J., Wagner B. Proc. SPIE 3226, Microelectronic Structures and MEMS for Optical Processing III, Austin:1997;6.
2. Gimkiewicz C., Hagedorn D., Jahns J., Kley E.-B., Thoma F. Appl. Opt. 38:(14):1999;2986-2990.
3. Daschner W., Long P., Larsson M., Lee S.H. J. Vac. Sci. Technol. B13:(6):1995;2729-2731.
4. Wu H., Odom T., Whitesides G.M. Anal. Chem. 74:2002;3267-3273.
5. Haslop J.M. The evolving threat. 9th Interpol Conference on Currency Counterfeiting, Helsinki, June:1997.
6. Leech P.W., Sexton B.A., Marnock R.J. Microelectron. Eng. 60:2002;339-346.
7. Lee R.A. Microelectron. Eng. 53:2000;513-516.
8. Lee R.A. Microelectron. Eng. 61-62:2002;105-111.
9. Gale M. Phys. World. 2:(11):1989;24-28.
10. Henke W., Hoppe W., Quenzer H.J., Staudt-Fischbach P., Wagner B. Proc. IEEE Micro Electro Mechanical Systems:1994;205-210.