Sub-nm topography measurement by deflectometry: Flatness standard and wafer nanotopography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4779, Issue , 2002, Pages 1-12

  Geckeler, Ralf D ^a   Weingärtner, Ingolf ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Autocollimator; Dimensional metrology; Flatness standard; Scanning deflectometry; Topography; Traceability

Indexed keywords

ALGORITHMS; ANGLE MEASUREMENT; INTERFEROMETERS; LIGHT REFLECTION; NANOTECHNOLOGY; OPTICAL COLLIMATORS; PRISMS; SCANNING; SEMICONDUCTOR MATERIALS; SURFACE MEASUREMENT;

AUTOCILLIMATOR; EXTENDED SHEAR ANGLE DEFLECTOMETRY; FLATNESS STANDARD; OPTICAL SURFACE MEASUREMENT; SCANNING DEFLECTOMETRY; TOPOGRAPHY MEASUREMENT; TRACEABILITY; WAFER NANOTOPOGRAPHY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0036987049     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.451723     Document Type: Conference Paper

References (8)

1. I. Weingärtner, M. Schulz, Proceedings Europto Series, 3739, 274-282, 1999
2. I. Weingärtner, M. Schulz, C. Elster, Proc. SPIE, 3782, 306-317, 1999
3. C. Elster, I. Weingärtner, J. Opt. Soc. Am., 16, 2281-2285, 1999
4. C. Elster, I. Weingärtner, Appl. Optics, 38, pp. 5024-5031, 1999
5. C. Elster, I. Weingärtner, SPIE Seattle 2002, in prep.
6. Guide to the Expression of Uncertainty in Measurement, ISO, Geneva, Switzerland, 1993
7. R.D. Geckeler, I. Weingärtner, A. Just, R. Probst, Proc. SPIE, 4401, 184-195, 2001
8. R. Probst et al., Meas. Sci. Technol., 9, 1059-1066, 1998