Far- and mid-infrared absorption study of HfO2/SiO 2/Si system

Proceedings - Electrochemical Society

Volumn PV 2005-01, Issue , 2005, Pages 471-481

  Toriumi, A ^a   Tomida, K ^a   Shimizu, H ^a   Kita, K ^a   Kyuno, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FOURIER TRANSFORMS; LIGHT ABSORPTION; PERMITTIVITY; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

INFRARED ABSORPTION; INTERFACE LAYERS;

HAFNIUM COMPOUNDS;

EID: 31844439896     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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