메뉴 건너뛰기




Volumn 499, Issue 1-2, 2006, Pages 161-167

The influence of chemical post-etching and UV irradiation on the optical absorption and thermal diffusivity of porous silicon studied by photoacoustic technique

Author keywords

Optical absorption; Photoacoustic technique; Porous silicon; Thermal diffusivity; UV irradiation

Indexed keywords

ETCHING; IRRADIATION; LIGHT ABSORPTION; PHOTOACOUSTIC EFFECT; SILICON WAFERS; THERMAL DIFFUSION; ULTRAVIOLET RADIATION;

EID: 31544481870     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.037     Document Type: Conference Paper
Times cited : (5)

References (31)
  • 28
    • 31544447521 scopus 로고    scopus 로고
    • T. Matsumoto T. Takizawa S. Shirakata T. Wada N. Yamamoto The Institute of Pure and Applied Physics Japan
    • Q. Shen, and T. Toyoda T. Matsumoto T. Takizawa S. Shirakata T. Wada N. Yamamoto Ternary and Multinary Compounds in the 21st Century 2001 The Institute of Pure and Applied Physics Japan 256
    • (2001) Ternary and Multinary Compounds in the 21st Century , pp. 256
    • Shen, Q.1    Toyoda, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.