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Volumn 499, Issue 1-2, 2006, Pages 161-167
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The influence of chemical post-etching and UV irradiation on the optical absorption and thermal diffusivity of porous silicon studied by photoacoustic technique
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Author keywords
Optical absorption; Photoacoustic technique; Porous silicon; Thermal diffusivity; UV irradiation
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Indexed keywords
ETCHING;
IRRADIATION;
LIGHT ABSORPTION;
PHOTOACOUSTIC EFFECT;
SILICON WAFERS;
THERMAL DIFFUSION;
ULTRAVIOLET RADIATION;
CHEMICAL POST-ETCHING;
PHOTOACOUSTIC TECHNIQUE;
THERMAL DIFFUSIVITY;
UV IRRADIATION;
POROUS SILICON;
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EID: 31544481870
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.07.037 Document Type: Conference Paper |
Times cited : (5)
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References (31)
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