Morphology control of patterned carbon nanofiber arrays for field emission applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 A, 2006, Pages 346-349

  Kim, Dong Wook ^a   Jin, Sungho ^b  

^a Hanyang University   (South Korea)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Carbon nanofiber; Dc plasma enhanced chemical vapor deposition; Field emission; Morphology

Indexed keywords

ASPECT RATIO; CATALYSTS; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CARBON NANOFIBERS (CNFS); DC PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; FIELD EMISSIONS; NI CATALYST DOTS;

CARBON FIBERS;

EID: 31544434532     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.346     Document Type: Article

References (16)

1. J. Bonard, K. A. Dean, B. F. Coll and C. Klinke: Phys. Rev. Lett. 89 (2002) 197602.
2. W. Zhu, C. Bower, O. Zhou, G. Kochanski and S. Jin: Appl. Phys. Lett. 75 (1999) 873.
3. K. A. Dean and B. R. Chalamala: Appl. Phys. Lett. 76 (2000) 375.
4. J. Bonard, C. Klinke, K. A. Dean and B. F. Coll: Phys. Rev. B 67 (2003) 115406.
5. V. V. Zhimov, C. Lizzul-Rinne, G. J. Wojak, R. C. Sanwald and J. J. Hren: J. Vac. Sci. Technol. B 19 (2001) 87.
6. J. G. Wen, Z. P. Huang, D. Z. Wang, J. H. Chen, S. X. Yang, Z. F. Ren, J. H. Wang, L. E. Calvet, J. Chen. J. F. Klemic and M. A. Reed: J. Mater. Res. 16 (2001) 3246.
7. M. Chhowalla, K. B. K. Teo, C. Ducati, N. L. Rupesinghe, G. A. J. Araaratunga, A. C. Ferrari, D. Roy, J. Robertson and W. I. Milne: J. Appl. Phys. 90 (2001) 5308.
8. V. I. Merkulov, A. V. Melechko, M. A. Guillorn, D. H. Lowndes and M. L. Simpson: Appl. Phys. Lett. 80 (2002) 476.
9. G. Pirio, P. Legagneux, D. Pribat, K. B. K. Teo, M. Chhowalla, G. A. J. Amaratunga and W. I. Milne: Nanotechnology 13 (2002) 1.
10. D.-W. Kim, L.-H. Chen, J. F. AuBuchon, I. C. Chen, S. H. Jeong, I. K. Yoo and S. Jin: Carbon 43 (2005) 835.
11. L. R. Baylor, V. I. Merkulov, E. D. Ellis, M. A. Guillorn, D. H. Lowndes, A. V. Melechko, M. L. Simpson and J. H. Whealton: J. Appl. Phys. 91 (2002) 4602.
12. L.-H. Chen, J. F. AuBuchon, A. I. Gapin, C. Daraio, P. Bandaru, S. Jin, D.-W. Kim, I. K. Yoo and C. M. Wang: Appl. Phys. Lett. 85 (2004) 5373.
13. J. F. AuBuchon, L.-H. Chen, A. I. Gapin, D.-W. Kim, C. Daraio and S. Jin: Nano Lett. 4 (2004) 1781.
14. T. Utsumi: IEEE Trans. Electron Devices 38 (1991) 2276.
15. R. C. Smith, D. C. Cox and S. R. P. Silva: Appl. Phys. Lett. 87 (2005) 103112.
16. L. Nilsson, O. Groening, P. Groening and L. Schlapbach: Appl. Phys. Lett. 79 (2001) 1036.